• Document: Tanner EDA L-edit (Layout Editor)
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Tanner EDA L-edit (Layout Editor) Tanner Tools … “Speeding Concept to Silicon” NOTE: This tutorial was EDA=“Electronic Design and Automation” constructed in L-edit version 1.15 (c. October 2007) http://www.tanner.com/eda/ © Robert White 2012 Layout Layout is essentially a drawing process. You are drawing the two- dimensional geometries that will end up on your mask. Layout tools are essentially CAD drawing tools, but include additional useful features. Every area of each mask will be either opaque or clear. That is what you are trying to define… which areas are which. © Robert White 2012 Files and Tapeout Your end product is a file which contains the data for your mask. The process of transmitting the data to a foundry who will build your device is called “tapeout”… you are sending your magnetic tape out. Standard format is GDSII (“Graphic Data System” – Version II). It includes information on the layers of your design and the 2D geometries. OASIS (Open Artwork System Interchange Standard) is a new (2004) specification which is attempting to replace GDSII. It is more efficient in its storage format (10-50 times) than GDSII. Other common formats are CIF (Caltech Interchange Format), DXF (Drawing Exchange Format…AutoCAD), and Gerber (Printed Circuit Board…PCB) files. Sometimes companies will charge you an additional fee to convert your CAD format into GDSII so they can make your masks. © Robert White 2012 Layout Editors Commercial Code: Cadence “Virtuoso” IC Industry Leaders Mentor Graphics “IC Station” Tanner EDA “L-edit” MEMS Centric Freeware: Magic IC Centric, established Gnu software Layout Editor IC and MEMS, Freeware, Reads/writes GDSII, CIF, DXF, OASIS © Robert White 2012 Why Tanner EDA L-edit? MEMS Centric : Includes curved features! License is less expensive the Cadence/Mentor Graphics. Runs on PC (not UNIX). Better than freeware (although Layout Editor looks pretty good!) But… any of them would work just fine (except for Magic, maybe). I did my PhD work in Mentor Graphics. Tufts ECE uses Cadence for VLSI work. © Robert White 2012 Goal: We have a 3 layer process with a 4 micron minimum feature size. The three layers are: (1) A silicon nitride structural layer (“nitride” GDSII layer 1) (2) An anchor layer where we etch through our oxide to attach the beam (“anchor” GDSII layer 2) (3) A metal layer for use as a strain gauge and as electrical connections (“metal” GDSII layer 3) I want to design a cantilevered beam with a metal strain gauge on it. © Robert White 2012 File and Location Launch L-edit Cell Name Toolbars Aerial View Layer Palette Drawing Window Mouse Buttons Start Menu Engineering and Science Apps L-edit v12.1 © Robert White 2012 Make a New File Make a new file of type “Layout”. “TDB” is “Tanner DataBase”… your layout will be saved in a TDB file, a proprietary Tanner format. If you want to copy setup information from an existing TDB file, browse to it. (For instance, this could copy Design Rules This will create a new layout with a and Layer Names). name like “Layout1” and with a single Select <empty> for a cell, “Cell0”. new file with no setup information. © Robert White 2012 Setup Technology Go to Setup | Design.

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